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Proceedings Paper

Productivity enhancements in recipe creation for overlay metrology measurements
Author(s): Vincent Vachellerie; Delia Ristoiu; Alain G. Deleporte; Marc Poulingue; Yannick Bedin; Rolf Arendt; Ganesh Sundaram; Paul C. Knutrud
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Paper Abstract

As the number of varied devices produced by a fab increase, coupled with an increased complexity in those devices which call for an ever increasing number of process layers, in- line process control via metrology can become an impossible task, unless metrology recipe management schemes are implemented. Logic fabs are now introducing more than 1 new device per day, which can result in the writing and management of thousands of recipes, which in turn can lead to the costly consumption of tool and personnel resources sand a general loss in productivity. In this paper we present the productivity gains to be made in the recipe creation process through off-line recipe generation, as well as a method of decreasing the recipe optimization time. We will also outline the concept of Just In Time recipe creation, its contribution to productivity gains, and its generalized implementation with respect to Overlay Metrology recipes.

Paper Details

Date Published: 16 July 2002
PDF: 10 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473492
Show Author Affiliations
Vincent Vachellerie, STMicroelectronics (France)
Delia Ristoiu, STMicroelectronics (France)
Alain G. Deleporte, STMicroelectronics (France)
Marc Poulingue, Schlumberger Semiconductor Solutions (France)
Yannick Bedin, Schlumberger Semiconductor Solutions (France)
Rolf Arendt, Schlumberger Semiconductor Solutions (Germany)
Ganesh Sundaram, Schlumberger Semiconductor Solutions (United States)
Paul C. Knutrud, Schlumberger Semiconductor Solutions (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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