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Proceedings Paper

Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography
Author(s): Richard K. Cole; Franco Cerrina
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Paper Abstract

An unique lithography beamline is described that delivers x-rays using a flexible arrangement of two toroidal mirrors providing high spectral and spatial uniformity at the wafer plane. The image produced is a thin, scannable, horizontal line suitable for exposing a 25 nm X 50 nm field, compatible with submicron ULSI. The authors also present the current status of such a beamline currently under construction at CXrL for use with the Silicon Valley Group Lithography, Inc.'s 0.25 micron x-ray stepper.

Paper Details

Date Published: 1 August 1991
PDF: 11 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47348
Show Author Affiliations
Richard K. Cole, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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