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Proceedings Paper

Defect printability analysis study using virtual stepper system in a production environment
Author(s): Shao-Yung Chiou; Henrry Lei; WeiJyh Liu; M. J. Chu; Daryl Chiang; Steve Tuan; Chia-Lung Hong; Michael Chang; Jiunn-Hung Chen; Kevin K. Chan; Qi-De Qian; Lynn Cai; Linyong Pang
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Paper Abstract

In this paper the simulation of wafer images for Attenuated Phase Shift Masks (ATTPSM) and repaired binary masks are performed by Virtual Stepper System in a real production environment. In addition, the Automatic Defect Severity Scoring module in Virtual Stepper is also used to calculate the defect severity score for each defect. ADSS provides an overall score that quantifies the impact of a given defect on the surrounding features. For the binary masks, the quality of reported defects is studied. For the ATTPSM three types of programmed defects on both line/space and contact hole patterns are assessed. Wafer exposures are performed using 248 nm imaging technology and inspection images generated on a KLA-Tencor's SLF27 system. These images are used by the Virtual Stepper System to simulate wafer images under the specific stepper parameters. The result are compared to SEM images of resist patterns and Aerial Image Measurement System simulated results.

Paper Details

Date Published: 16 July 2002
PDF: 12 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473465
Show Author Affiliations
Shao-Yung Chiou, United Microelectronics Corp. (Taiwan)
Henrry Lei, United Microelectronics Corp. (Taiwan)
WeiJyh Liu, United Microelectronics Corp. (Taiwan)
M. J. Chu, United Microelectronics Corp. (Taiwan)
Daryl Chiang, United Microelectronics Corp. (Taiwan)
Steve Tuan, Toppan Chunghwa Electronics Corp. (Taiwan)
Chia-Lung Hong, Toppan Chunghwa Electronics Corp. (Taiwan)
Michael Chang, Toppan Chunghwa Electronics Corp. (Taiwan)
Jiunn-Hung Chen, Numerical Technologies, Inc. (Taiwan)
Kevin K. Chan, Numerical Technologies, Inc. (United States)
Qi-De Qian, Numerical Technologies, Inc. (United States)
Lynn Cai, Numerical Technologies, Inc. (United States)
Linyong Pang, Numerical Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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