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Proceedings Paper

Complementary use of scatterometry and SEM for photoresist profile and CD determination
Author(s): Yuya Toyoshima; Isao Kawata; Yasutsugu Usami; Yasuhiro Mitsui; Apo Sezginer; Eric Maiken; Kin-Chung Chan; Kenneth Johnson; Dean Yonenaga
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Paper Abstract

Scatterometry is gaining acceptance as a technique for critical dimension (CD) metrology that complements the more established scanning electron microscopy (SEM) techniques. Scatterometry determines the dimensions of the submicron structures by inverse diffraction calculations. SEM and scatterometry are complementary in many respects. Therefore, they are likely to coexist in the foreseeable future. Scatterometry and CD-SEM instruments can be integrated to take advantage of the complementary nature of the two techniques. To explore the joint use of scatterometry and SEM measurements, we measured a set of photoresist grating samples with CDs ranging from 240 nm through 40 nm by scatterometer (Sensys CD-i) and cross-section SEM (Hitachi S-4700). Although a cross-section SEM was used as an absolute standard for comparison of profiles and CDs, our conclusions range to include CD-SEM techniques. It was found that for measurements of profiles that were patterned with high uniformity within the measurement area, scatterometry was very effective, and correlated best with SEM measurements. However, in cases of substantial line-to-line profile variations, or for isolated or non-periodic lines, SEM is the more appropriate measurement method.

Paper Details

Date Published: 16 July 2002
PDF: 10 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473458
Show Author Affiliations
Yuya Toyoshima, Hitachi High-Technologies Corporation (Japan)
Isao Kawata, Hitachi High-Technologies Corporation (Japan)
Yasutsugu Usami, Hitachi High-Technologies Corporation (Japan)
Yasuhiro Mitsui, Hitachi High-Technologies Corporation (Japan)
Apo Sezginer, Sensys Instruments, Inc. (United States)
Eric Maiken, Sensys Instruments, Inc. (United States)
Kin-Chung Chan, Sensys Instruments, Inc. (United States)
Kenneth Johnson, Sensys Instruments, Inc. (United States)
Dean Yonenaga, Sensys Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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