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Proceedings Paper

Multilayer optics for soft x-ray projection lithography: problems and prospects
Author(s): Daniel Gorman Stearns; Natale M. Ceglio; Andrew M. Hawryluk; Robert S. Rosen; Stephen P. Vernon
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Paper Abstract

The current state-of-the-art in multilayer x-ray optics is presented, and the specific problems posed by projection lithography are considered. To make soft x-ray projection lithography a viable technology, the multilayer optics must demonstrate both high normal incidence reflectivity and long-term stability in the potential hostile lithography environment.

Paper Details

Date Published: 1 August 1991
PDF: 8 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47345
Show Author Affiliations
Daniel Gorman Stearns, Lawrence Livermore National Lab. (United States)
Natale M. Ceglio, Lawrence Livermore National Lab. (United States)
Andrew M. Hawryluk, Lawrence Livermore National Lab. (United States)
Robert S. Rosen, Lawrence Livermore National Lab. (United States)
Stephen P. Vernon, Vernon Applied Physics (United States)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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