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Proceedings Paper

Factors influencing CD-SEM metrology
Author(s): Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt
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Paper Abstract

Nanometrology LLC has developed a unique set of solutions for optimizing CD-SEM metrology by improving signal to noise ratio and quantifying scan non-linearity. Examples of Nanometrology's solutions for improved CD-SEM magnification calibration are demonstrated using CD-SEMs from a variety of user sites. To our knowledge, this is the first time that a method to quantify CD-SEM scan non-linearity with precision 0.1 percent has been reported. Calibration precision of 0.1 percent or better can be achieved on both cross-section and CD-SEMs to enable them to meet or exceed the requirements of the ITRS roadmap beyond 2014.

Paper Details

Date Published: 16 July 2002
PDF: 11 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473447
Show Author Affiliations
Albert Sicignano, Nanometrology LLC (United States)
Arkady V. Nikitin, Nanometrology LLC (United States)
Dmitriy Y. Yeremin, Nanometrology LLC (United States)
Matthew Sandy, Nanometrology LLC (United States)
E. Tim Goldburt, Nanometrology LLC (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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