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Proceedings Paper

Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node
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Paper Abstract

The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH consortium's Member Companies and from the National Institute of Standards (NIST). The AMAG wrote and, in 2000, updated the 'Unified Advanced CD-SEM Specification for Sub- 0.18 micrometers Technology to be a living document which outlines the required performance of advanced CD-SEMs for vendor compliance to the International Technology Roadmap for Semiconductors, and also conveys other Member companies' collective needs to vendors. Following this specification, a benchmarking effort of the four currently available advanced CD-SEMs has been performed. This paper presents the result of this effort. Previous studies under this same project have ben published.

Paper Details

Date Published: 16 July 2002
PDF: 14 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473444
Show Author Affiliations
Benjamin D. Bunday, International SEMATECH (United States)
Michael Bishop, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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