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Proceedings Paper

Optimization of Eth method for DUV process inline monitor
Author(s): Wenzhan Zhou; Hao Chen; Teng Hwee Ng; Hui Kow Lim
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Paper Abstract

In this paper, we describe the optimization strategy for Eth (Dose to clear) method of DUV resist process control for 0.25um technology. Both experimental and simulation results will be presented to show the optical and developing behaviors of DUV resist in extreme low energy exposure condition. Based on these data we proposed an optimized method of Eth measurement. With this method, false alarm of DUV resist photo-speed and exposure out of control will be eliminated, cost of manpower for OOC troubleshooting will be saved.

Paper Details

Date Published: 16 July 2002
PDF: 8 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473442
Show Author Affiliations
Wenzhan Zhou, Chartered Semiconductor Manufacturing, Ltd. (Singapore)
Hao Chen, Chartered Semiconductor Manufacturing, Ltd. (Singapore)
Teng Hwee Ng, Chartered Semiconductor Manufacturing, Ltd. (Singapore)
Hui Kow Lim, Chartered Semiconductor Manufacturing, Ltd. (Singapore)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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