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Proceedings Paper

Defect repair for gold absorber/silicon membrane x-ray masks
Author(s): Diane K. Stewart; Jacob Fuchs; Robert Allen Grant; Irving Plotnik
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Paper Abstract

X-ray mask repair is a critical element in the commercialization of x-ray lithography. The purpose of this paper is to demonstrate routine repair of conventional defects on an x-ray mask and to test the repairs by exposure to an x-ray stepper.

Paper Details

Date Published: 1 August 1991
PDF: 14 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47344
Show Author Affiliations
Diane K. Stewart, Micrion Corp. (United States)
Jacob Fuchs, Micrion Corp. (United States)
Robert Allen Grant, Hampshire Instruments, Inc. (United States)
Irving Plotnik, Hampshire Instruments, Inc. (United States)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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