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Proceedings Paper

2D-image-based CD-SEM applications for thin film head metrology
Author(s): Srinath Venkataram; Neeraj Khanna; Sanford Lewis; Gautam Khera
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Paper Abstract

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Paper Details

Date Published: 16 July 2002
PDF: 12 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473416
Show Author Affiliations
Srinath Venkataram, KLA-Tencor Corp. (United States)
Neeraj Khanna, KLA-Tencor Corp. (United States)
Sanford Lewis, IBM Corp. (United States)
Gautam Khera, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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