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Proceedings Paper

Evaluation of lithographic imaging performance by optical area measurement
Author(s): Ilya Grodnensky; Shinji Mizutani; Steve D. Slonaker
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Paper Abstract

We present a new technique for accurate and fast evaluation of lithographic imaging performance at critical dimensions (CDs) of 100 nm and below. Its advantages over traditional methods that use either SEM or electrical CD metrologies are based on two key factors. First, it exploits a specially designed mark corresponding to a particular CD. Second, instead of mark dimensions the mark image irradiance is measured with a CCD TV camera. In combination, these provide an easy-to-implement and inexpensive technique for controlling exposure tool imaging performance. In actual application, best focus determination shows a repeatability of less than 5 nm.

Paper Details

Date Published: 16 July 2002
PDF: 6 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473410
Show Author Affiliations
Ilya Grodnensky, Nikon Precision Inc. (United States)
Shinji Mizutani, Nikon Precision Inc. (United States)
Steve D. Slonaker, Nikon Precision Inc. (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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