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Proceedings Paper

Future of e-beam metrology: obstacles and opportunities
Author(s): David C. Joy
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Paper Abstract

Electron-beam tools have been an important part of the semiconductor industry since its beginnings especially in the area of metrology and are a major contributor towards the goals of process control and yield enhancement. However, in order to stay on the Moore's Law curve instrument performance must be improved by a factor of two every two or three years and with the proximity of fundamental physical limits such major improvements in performance become increasingly difficult to obtain. This paper examines the opportunities that exist for continued improvement, and considers what other options are available for tools to replace the CD-SEM and its associates.

Paper Details

Date Published: 16 July 2002
PDF: 10 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473408
Show Author Affiliations
David C. Joy, Univ. of Tennessee/Knoxville and Oak Ridge National Lab. (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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