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Proceedings Paper

Formation of Si02 film on plastic substrate by liquid-phase-deposition method
Author(s): Masaki Kitaoka; Hisao Honda; Harunobu Yoshida; Akio Takigawa; Hideo Kawahara
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Paper Abstract

The silicon dioxide (SiO2) film deposition on a plastic was made by liquid phase deposition (LPD) method. This process involves the deposition and growth of SiO2 layer on the plastic while immersing it in the hexafluorosilicic acid (H2SiF6) solution supersaturated with silica. In this study, it was shown that the specific pretreatment of the plastic surface by silane coupling agent was required for better adhesion of the SiO2 film. And the SiO2 film properties, resistance of organic solvent, water vapor permeability and water absorptivity, were evaluated in order to apply the 'LPD-SiO2' film to the protective layer of the polycarbonate (PC) disk for optical memory. As a result, it was shown that the 'LPD-SiO2' film could improve the properties of the plastic substrate.

Paper Details

Date Published: 1 November 1991
PDF: 6 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47296
Show Author Affiliations
Masaki Kitaoka, Nippon Sheet Glass Co., Ltd. (Japan)
Hisao Honda, Nippon Sheet Glass Co., Ltd. (Japan)
Harunobu Yoshida, Nippon Sheet Glass Co., Ltd. (Japan)
Akio Takigawa, Nippon Sheet Glass Co., Ltd. (Japan)
Hideo Kawahara, Nippon Sheet Glass Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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