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Proceedings Paper

Stress and curvature in MEMS mirrors
Author(s): Fawn R. Gass; Daryl J. Dagel; David P. Adams; Grant D. Grossetete; Olga Blum Spahn; Shanalyn A. Kemme; Seethambal S. Mani; Kevin J Malloy
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Paper Abstract

The goal of this study is to understand how to optimize the performance of micro-mirrors for a variety of optical microsystem applications. Our approach relies on a number of process variations and mirror designs to ultimately produce relatively large (500μm to mm-scale), smooth (for nm RMS), and flat mirrors (greater than 1m curvature). White-light interferometric measurements, and finite element models are discussed in support of these findings. Stress gradients and residual stresses have been measured for accurate modeling of micro-mirrors. Through this modeling study, we have identified relevant structural parameters that will optimize SUMMiT V MEMS mirrors for optical applications. Ways of mitigating surface topography, print-through effects, and RMS roughness are currently being investigated.

Paper Details

Date Published: 21 January 2003
PDF: 7 pages
Proc. SPIE 4983, MOEMS and Miniaturized Systems III, (21 January 2003); doi: 10.1117/12.472899
Show Author Affiliations
Fawn R. Gass, Sandia National Labs. (United States)
Daryl J. Dagel, Sandia National Labs. (United States)
David P. Adams, Sandia National Labs. (United States)
Grant D. Grossetete, L&M Technologies, Inc. (United States)
Olga Blum Spahn, Sandia National Labs. (United States)
Shanalyn A. Kemme, Sandia National Labs. (United States)
Seethambal S. Mani, Sandia National Labs. (United States)
Kevin J Malloy, CHTM/Univ. of New Mexico (United States)

Published in SPIE Proceedings Vol. 4983:
MOEMS and Miniaturized Systems III
James H. Smith, Editor(s)

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