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Proceedings Paper

X-ray evaluation on residual stresses in vapor-deposited hard coatings
Author(s): Kewei Xu; Jin Chen; Runsheng Gao; Jia Wen He; Cheng Zhao; Shizhi Li
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Paper Abstract

Residual stresses in plasma assisted vapor deposited (PECVD) TiN coatings were evaluated with x-ray diffraction method. They are tensile on substrate of cemented carbide, but compressive on that of steel. The magnitude is between those made by chemical vapor deposition (CVD) and physical vapor deposition (PVD). The residual stresses display different values on a substrate of steel or cemented carbide, yet no distinct change on substrates of various kinds of steels or of cemented carbides. As the depositing temperature increases, both the macro and the micro residual stress represented by the relative displacement and the broadening of diffraction profile decrease. This implies that the stresses produced by PECVD in normally lower temperature are dominated mainly by the constituents and microstructural aspects of the coating material rather than by different thermal expansions between the coating and the substrate.

Paper Details

Date Published: 1 November 1991
PDF: 6 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47289
Show Author Affiliations
Kewei Xu, Xi'an Jiaotong Univ. (China)
Jin Chen, Xi'an Jiaotong Univ. (China)
Runsheng Gao, Xi'an Jiaotong Univ. (China)
Jia Wen He, Xi'an Jiaotong Univ. (China)
Cheng Zhao, Qingdao Institute of Chemical Technology (China)
Shizhi Li, Qingdao Institute of Chemical Technology (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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