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Proceedings Paper

Sputtering of silicate glasses
Author(s): Teruhiko Kai; Hiromichi Takebe; Kenji Morinaga
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Paper Abstract

Each of the amorphous films that consists of SiO2, Al2O3, CaO-SiO2, or CaO-Al2O3 system was prepared by rf-sputtering. Changes of film thickness, structure, composition, and transmittance in the visible region depending on the sputtering time were discussed. Especially, the chemical shifts of SiK(alpha) and AlK(alpha) were measured for study of structure and composition of the films by using a high resolution x-ray fluorescence spectrometer with double crystals.

Paper Details

Date Published: 1 November 1991
PDF: 5 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47272
Show Author Affiliations
Teruhiko Kai, Kyushu Univ. (Japan)
Hiromichi Takebe, Kyushu Univ. (Japan)
Kenji Morinaga, Kyushu Univ. (Japan)

Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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