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Proceedings Paper

High-field electron trapping and detrapping characteristics in thin SiOxNy films
Author(s): Bing Liang Yang; Bai Yong Liu; Y. C. Cheng; HonLeung Kelvin Wong
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Paper Abstract

The electron trapping at high-field and detrapping in thin thermally nitrided silicon oxide (SiOxNy) films were studied in the present work. For lightly nitrided oxide, the effective electron trap concentration was found to increase rapidly with the nitridation duration. In addition, the detrapping ratio of trapped electrons is almost zero and independent of the detrapping time and the applied field strength up to 8 MV/cm. This observation indicates that the increased traps have deeper energy levels. For heavily-nitrided sample, the surface trap concentration decreases and the energy levels of these traps become shallower. The detrapping ratio therefore increases and is an exponential function of the field strength and detrapping time. The detrapping ratio remains unchanged if no external field is applied.

Paper Details

Date Published: 1 November 1991
PDF: 6 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47267
Show Author Affiliations
Bing Liang Yang, South China Univ. of Technology (China)
Bai Yong Liu, South China Univ. of Technology (China)
Y. C. Cheng, City Polytechnic of Hong Kong (Hong Kong China)
HonLeung Kelvin Wong, City Polytechnic of Hong Kong (Hong Kong China)

Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang, Editor(s)

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