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Proceedings Paper

Research of Cr2O3 thin film deposited by arc discharge plasma deposition as heat-radiation absorbent in electric vacuum devices
Author(s): Hong Deng; Xiang Dong Wang; Lei Yuan
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Paper Abstract

Formation of chrome oxide thin film on an iron substrate by arc discharge plasma as a heat- radiation absorbent in electric vacuum devices is described. Only oxygen as reaction gas without argon is applied in the discharge chamber and an improved film with good properties is obtained.

Paper Details

Date Published: 1 November 1991
PDF: 5 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47262
Show Author Affiliations
Hong Deng, Beijing Vacuum Electronics Research Institute (China)
Xiang Dong Wang, Beijing Lab. of Vacuum Physics (China)
Lei Yuan, Beijing Lab. of Vacuum Physics (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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