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Proceedings Paper

Application of MR damper to base-isolated structures
Author(s): Norio Iwata; Katsuhiko Hata; Hiroshi Sodeyama; Katsuaki Sunakoda; Hideo Fujitani; Takeshi Hiwatashi; Yoichi Shiozaki; Satsuya Soda
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Paper Abstract

This paper presents a comprehensive study on the application of the MR damper to base-isolated building structures. It first proposes a simple semi-active control algorithm for a base-isolated structure with an MR damper. The algorithm, in which the MR damper's hysteresis shape is controlled, aims to reduce the isolator's displacement without increasing the acceleration responses of the upper structures. The second part of this paper covers the properties of an MR fluid and an MR damper developed for a base-isolated model structure. The damper has a nominal capacity of 40kN, which can be adjusted in accordance with the applied magnetic fields. In the test, the damper is subjected to cyclic sinusoidal displacements with different amplitudes, velocities and magnetic field intensities. The last part describes shaking table tests carried out using the MR damper and the base-isolated model structure. It is confirmed that the proposed semi-active control method is effective in reducing the isolator's displacement without increasing the acceleration responses.

Paper Details

Date Published: 28 June 2002
PDF: 11 pages
Proc. SPIE 4696, Smart Structures and Materials 2002: Smart Systems for Bridges, Structures, and Highways, (28 June 2002); doi: 10.1117/12.472572
Show Author Affiliations
Norio Iwata, Kinki Univ. (Japan)
Katsuhiko Hata, Bando Chemical Industries, Ltd. (Japan)
Hiroshi Sodeyama, Sanwa Tekki Corp. (Japan)
Katsuaki Sunakoda, Sanwa Tekki Corp. (Japan)
Hideo Fujitani, Building Research Institute (Japan)
Takeshi Hiwatashi, Building Research Institute (Japan)
Yoichi Shiozaki, Building Research Institute (Japan)
Satsuya Soda, Waseda Univ. (Japan)


Published in SPIE Proceedings Vol. 4696:
Smart Structures and Materials 2002: Smart Systems for Bridges, Structures, and Highways
S.-C. Liu; Darryll J. Pines, Editor(s)

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