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Proceedings Paper

Ta/Al alloy thin film medium-power attenuator
Author(s): Bangchao Yang; Yu Ming Jia
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Paper Abstract

Ta/Al alloy resistive thin film has become more and more attractive in manufacture of the high-accurate and high-stable thin-film power resistance and its network due to its excellent thermal stability since the 1970s. In this paper, both Ta/Al alloy resistive film containing Al 50 at.% and the medium-power thin-film attenuator used for microwave circuit are studied and analyzed.

Paper Details

Date Published: 1 November 1991
PDF: 3 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47252
Show Author Affiliations
Bangchao Yang, Univ. of Electronic Science and Technology of China (China)
Yu Ming Jia, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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