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Proceedings Paper

New ion-beam sources and their applications to thin film physics
Author(s): David T. Wei; Harold R. Kaufman
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Paper Abstract

The development of ion sources for thin film coatings and modifications in the past decade are reviewed. Recent applications for optics and microelectronics are discussed.

Paper Details

Date Published: 1 November 1991
PDF: 9 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47248
Show Author Affiliations
David T. Wei, Xerox Corp. (United States)
Harold R. Kaufman, Front Range Research and Commonwealth Scientific Corp. (United States)

Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang, Editor(s)

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