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Proceedings Paper

System for angle-resolved and total light scattering, transmittance, and reflectance measurements of optical components at 157 nm and 193 nm
Author(s): Stefan Gliech; Henning Gessner; Angela Duparre
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Paper Abstract

A system is presented that measures total and angle resolved light scattering, reflectance and transmittance at 193 nm and 157 nm. Substrates and coatings for VUV lithography components can be investigated with high sensitivity, down to scattering levels of 1 ppm.

Paper Details

Date Published: 30 May 2003
PDF: 6 pages
Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003); doi: 10.1117/12.472395
Show Author Affiliations
Stefan Gliech, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Henning Gessner, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Angela Duparre, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 4932:
Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz; Adolf Giesen; Horst Weber, Editor(s)

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