Share Email Print
cover

Proceedings Paper

Wet etching for the mitigation of laser damage growth in fused silica
Author(s): Philippe Bouchut; Pierre Garrec; Catherine Pelle
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

On the 3ω part of the LIL laser many optical components will have to sustain fluences above 10J/cm2. Even if progress in silica substrate technology decreases the number of defects/cm2 which can induce a damage under such a laser flux, tens of damaged sites will appear on large surface optics. Knowing that these damaged sites grow exponentially with the number of laser shots, it is a necessity to stop the growth of these defects before the use of the optical component is impaired. In this paper we have used wet chemical etching as a way to circumvent the growth of laser-induced surface damages. SEM characterization of damages at all stages of the process has been carried out. We show that at a reduced damage creation fluence, the use of a highly concentrated HF acid leads to a 93% mitigation rate for those damaged sites that need mitigation. Due to the etching anisotropy, the HF acid concentration is more important than etch depth’s for the mitigation rate of laser induced surface damage in silica.

Paper Details

Date Published: 30 May 2003
PDF: 9 pages
Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003); doi: 10.1117/12.472389
Show Author Affiliations
Philippe Bouchut, CEA-LETI (France)
Pierre Garrec, CEA-LETI (France)
Catherine Pelle, CEA-LETI (France)


Published in SPIE Proceedings Vol. 4932:
Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz; Adolf Giesen; Horst Weber, Editor(s)

© SPIE. Terms of Use
Back to Top