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Proceedings Paper

Establishment of new criterion aiding the control of antireflection coating semiconductor diodes
Author(s): Yu Cun Lu; Da Yi Li; Jianguo Chen; Bin Luo
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Paper Abstract

The process of antireflector (AR) coating semiconductor diodes has been studied by employing the traveling-wave rate equations. As a result, a new criterion aiding the control of AR film deposition has been established. The agreement between theoretical predictions and experimental results is good.

Paper Details

Date Published: 1 November 1991
PDF: 4 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47234
Show Author Affiliations
Yu Cun Lu, Sichuan Univ. (China)
Da Yi Li, Sichuan Univ. (China)
Jianguo Chen, Sichuan Univ. (China)
Bin Luo, Sichuan Univ. (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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