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Proceedings Paper

Laser plasma radiation sources based on a laser-irradiated gas puff target for x-ray and EUV lithography technologies
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Rafal Rakowski; Miroslaw Szczurek
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Paper Abstract

In this paper laser plasma radiation sources for x-ray and EUV lithography technologies are proposed. The sources are based on a recently developed double-stream gas puff target formed by pulsed injection of high-Z gas into a hollow stream of low-Z gas by using the double-nozzle setup. Strong x-ray and EUV production from the laser-irradiated double- stream gas puff target has been demonstrated. Characterization measurements of the source performed using a Nd:glass laser are presented and discussed.

Paper Details

Date Published: 1 July 2002
PDF: 7 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472337
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
Miroslaw Szczurek, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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