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Proceedings Paper

Advanced deflector elements for high-throughput electron optical systems
Author(s): Oliver Kienzle; Rainer Knippelmeyer; Wilfried Claus; Marko Matijevic; Lars Ehrhardt; Wolf D. Rau; Alexander Orchowski
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Paper Abstract

We have successfully produced and outfitted in-lens deflector elements which can be used for off-axis aberration correction in high throughput electron optics. A thorough analysis of mechanical tolerances, the study of the effect of mechanical tolerances on the imaging performance, and the comparison of calculated and measured deflection fields indicate the capability of such deflector elements for reaching the demands of high throughput electron optical devices.

Paper Details

Date Published: 1 July 2002
PDF: 7 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472332
Show Author Affiliations
Oliver Kienzle, LEO GmbH (Germany)
Rainer Knippelmeyer, LEO GmbH (Germany)
Wilfried Claus, Carl Zeiss (Germany)
Marko Matijevic, LEO GmbH (Germany)
Lars Ehrhardt, LEO GmbH (Germany)
Wolf D. Rau, LEO GmbH (Germany)
Alexander Orchowski, LEO GmbH (Germany)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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