Share Email Print
cover

Proceedings Paper

Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment
Author(s): Hans Willy Becker; Lutz Aschke; Birgit Schubert; Juergen Krieger; Frank Lenzen; Sergey A. Yulin; Torsten Feigl; Thomas Kuhlmann; Norbert Kaiser
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

EUV mask blanks consist of two thin film systems deposited on low thermal expansion 6 inch substrates (LTEM). First there is the multilayer stack with around 100 alternating layers of elements with different optical properties which are topped by a capping layer. Beside optimal optical properties it is also necessary to improve the heat stability of the layer system. The absorber stack which consists of a buffer and an absorber layer is next. Here a minimum absorption of EUV light of 99 percent is required. The stress in both layer systems should be as low as possible. The reduction of defects to an absolute minimum is one of the main challenges. The high-reflective Mo/Si multilayer coatings were designed for normal incidence reflectivity and successfully deposited on 6-inch LTEM substrates by ion-beam sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer interfaces and the surface morphology. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation at the PTB reflectometer at BESSY II, Berlin, Germany.

Paper Details

Date Published: 1 July 2002
PDF: 6 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472326
Show Author Affiliations
Hans Willy Becker, Schott Lithotec AG (Germany)
Lutz Aschke, Schott Lithotec AG (Germany)
Birgit Schubert, Schott Lithotec AG (Germany)
Juergen Krieger, Schott Lithotec AG (Germany)
Frank Lenzen, Schott Lithotec AG (Germany)
Sergey A. Yulin, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Torsten Feigl, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Thomas Kuhlmann, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

© SPIE. Terms of Use
Back to Top