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Proceedings Paper

Static microfield printing at the advanced light source with the ETS Set-2 optic
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Erik H. Anderson; David T. Attwood; Phillip J. Batson; Jeffrey Bokor; Paul Denham; Eric M. Gullikson; Bruce D. Harteneck; Brian Hoef; Keith H. Jackson; Deirdre L. Olynick; Senajith Rekawa; Farhad Salmassi; Kenneth L. Blaedel; Henry N. Chapman; Layton C. Hale; Regina Soufli; Eberhard Adolf Spiller; Donald W. Sweeney; John R. Taylor; Christopher C. Walton; Avijit K. Ray-Chaudhuri; Donna J. O'Connell; Richard H. Stulen; Daniel A. Tichenor; Charles W. Gwyn; Pei-yang Yan; Guojing Zhang
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Paper Abstract

While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. The comparison of lithographic imaging with that predicted from wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology. To address these issues, static, small-field printing capabilities have been added to the EUV phase- shifting point diffraction interferometry implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. The combined system remains extremely flexible in that switching between interferometry and imaging modes can be accomplished in approximately two weeks.

Paper Details

Date Published: 1 July 2002
PDF: 8 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472318
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
David T. Attwood, Univ. of California/Berkeley (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Paul Denham, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Bruce D. Harteneck, Lawrence Berkeley National Lab. (United States)
Brian Hoef, Lawrence Berkeley National Lab. (United States)
Keith H. Jackson, Lawrence Berkeley National Lab. (United States)
Deirdre L. Olynick, Lawrence Berkeley National Lab. (United States)
Senajith Rekawa, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Kenneth L. Blaedel, Lawrence Livermore National Lab. (United States)
Henry N. Chapman, Lawrence Livermore National Lab. (United States)
Layton C. Hale, Lawrence Livermore National Lab. (United States)
Regina Soufli, Lawrence Livermore National Lab. (United States)
Eberhard Adolf Spiller, Lawrence Livermore National Lab. (United States)
Donald W. Sweeney, Lawrence Livermore National Lab. (United States)
John R. Taylor, Lawrence Livermore National Lab. (United States)
Christopher C. Walton, Lawrence Livermore National Lab. (United States)
Avijit K. Ray-Chaudhuri, Sandia National Labs. (United States)
Donna J. O'Connell, Sandia National Labs. (United States)
Richard H. Stulen, Sandia National Labs. (United States)
Daniel A. Tichenor, Sandia National Labs. (United States)
Charles W. Gwyn, Intel Corp. (United States)
Pei-yang Yan, Intel Corp. (United States)
Guojing Zhang, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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