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Proceedings Paper

Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films
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Paper Abstract

A novel class of photosensitive organometallic precursor materials is used to pattern thin film mixed-metal oxide structures. In this work a photosensitive organometallic precursor is coated onto a silicon substrate and exposed to ultraviolet light through a mask to form patterned oxide structures. This is a negative-tone process in which the unexposed areas can be washed away using a developer solvent. In this work, lithographic contrast curves were measured to characterize the sensitivity and contrast of thin films composed of a mixture of the organometallic precursors for the oxides barium, strontium and titanium. Experiments directed at finding methods to increase the photo-speed of these materials were also conducted. It was found that partial pre-exposure conversion of these films using thermal baking could be used to enhance the sensitivity of these materials. A pre-exposure bake performed at 150 degrees C for 15 seconds was found to decrease the required exposure dose by a factor of two. Dielectric properties were measured for photochemically converted oxide films via electrical measurements on parallel plate capacitor devices. X-ray photoelectron spectroscopy (XPS) was used to quantify the relative amounts of carbon present in the finished films, and it was determined that thermally processes films had higher levels of carbon contamination.

Paper Details

Date Published: 1 July 2002
PDF: 10 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472317
Show Author Affiliations
Sean Jeffrey Barstow, Georgia Institute of Technology (United States)
Augustin Jeyakumar, Georgia Institute of Technology (United States)
Clifford L. Henderson, Georgia Institute of Technology (United States)

Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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