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Proceedings Paper

At-wavelength inspection of defect smoothing in EUVL masks
Author(s): Moonsuk Yi; Min-Cheol Park; Paul B. Mirkarimi; Cindy C. Larson; Jeffrey Bokor
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Paper Abstract

Results of at-wavelength inspection of EUVL mask substrate defects that were smoothed by multilayer coatings are presented. Programmed mask substrate defects were made with 80nm gold (Au) spheres, which were deposited on the mask substrate before the Mo/Si reflective multilayer coating. After coating, at-wavelength and visible-light inspection were then performed. The smoothing process was found to be effective in significantly suppressing the EUV visibility of the defects.

Paper Details

Date Published: 1 July 2002
PDF: 6 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472314
Show Author Affiliations
Moonsuk Yi, Lawrence Berkeley National Lab. (United States)
Min-Cheol Park, Lawrence Berkeley National Lab. (United States)
Paul B. Mirkarimi, Lawrence Livermore National Lab. (United States)
Cindy C. Larson, Lawrence Livermore National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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