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Proceedings Paper

New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region
Author(s): Johannes Tuemmler; Frank Scholze; Guido M.L. Brandt; Bernd Meyer; Frank Scholz; Katrin Vogel; Gerhard Ulm; Michael Poier; Udo Klein; Wolfgang Diete
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Paper Abstract

Since 1986, the Physikalisch Technische Bundesanstalt (PTB), Germany's national metrology institute, has been working on the 'at-wavelength' characterization of VUV and EUV optical components with synchrotron radiation. Today, PTB operates a laboratory at the electron storage ring BESSY II. Here, at several beamlines, high-accuracy at-wavelength characterization of EUVL components is routinely carried out. Reflectometry is performed on a bending magnet beamline at which a relative uncertainty of 0.25 percent is achieved for the spectral reflectance of a mirror in the EUV spectral region. For the investigation of very large optical components, a new reflectometer will be set up at the soft x-ray radiometry beamline in March 2002. The reflectometer allows the characterization of full size EUVL optical components. Raster scans across the full sample surface can be performed in. Convex or concave profiles are allowed. An additional detector movement out of the scattering plane allows the measurement of bi-directional scattering. Similar measurements can be performed by mounting a cooled CCD camera at different fixed positions on the vacuum chamber. The motor step size for all translational and rotational movements will be 1 micrometers and 0.001 degrees, respectively. We present a detailed description of the new reflectometer for large EUV optics and discuss the uncertainties to be achieved for reflectance measurements.

Paper Details

Date Published: 1 July 2002
PDF: 10 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472307
Show Author Affiliations
Johannes Tuemmler, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Guido M.L. Brandt, Physikalisch-Technische Bundesanstalt (Belgium)
Bernd Meyer, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholz, Physikalisch-Technische Bundesanstalt (Germany)
Katrin Vogel, Physikalisch-Technische Bundesanstalt (Germany)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Michael Poier, ACCEL Instruments GmbH (Germany)
Udo Klein, ACCEL Instruments GmbH (Germany)
Wolfgang Diete, ACCEL Instruments GmbH (Germany)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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