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Proceedings Paper

Status of the liquid-xenon-jet laser-plasma source for EUV lithography
Author(s): Bjoern A. M. Hansson; Lars Rymell; Magnus Berglund; Oscar E. Hemberg; Emmanuelle Janin; Jalmar Thoresen; Sofia Mosesson; Johan Wallin; Hans M. Hertz
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Paper Abstract

The liquid-xenon-jet laser-plasma source is one of the extreme-ultraviolet (EUV) source technologies under development for EUV lithography. This paper presents some recent improvements of the technology, including the ability to operate a stable plasma at a distance of 50 mm from the nozzle, the first positive mirror-lifetime results, and improved laser-to-EUV conversion efficiency of 0.75 percent at lambda equals 13.45 nm.

Paper Details

Date Published: 1 July 2002
PDF: 8 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472274
Show Author Affiliations
Bjoern A. M. Hansson, Innolite AB and Royal Institute of Technology (Sweden)
Lars Rymell, Innolite AB (Sweden)
Magnus Berglund, Innolite AB (Sweden)
Oscar E. Hemberg, Innolite AB and Royal Institute of Technology (Sweden)
Emmanuelle Janin, Innolite AB (Sweden)
Jalmar Thoresen, Innolite AB (Sweden)
Sofia Mosesson, Innolite AB (Sweden)
Johan Wallin, Innolite AB (Sweden)
Hans M. Hertz, Royal Institute of Technology (Sweden)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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