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Proceedings Paper

Physical properties of the HCT EUV source
Author(s): Joseph Pankert; Klaus Bergmann; J. Klein; Willi Neff; Oliver Rosier; Stefan Seiwert; Christopher Smith; Rolf Apetz; Jeroen Jonkers; Michael Loeken; Guenther H. Derra
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Paper Abstract

The paper describes the physical properties and recent technical advances of the hollow cathode triggered pinch device (HCT) for the generation of EUV radiation. In previous publications we have demonstrated continuous operation of the untriggered device at 1 kHz in pure Xe. The newer generations operate with a triggering facility which allows a wider parameter space under which stable operation is possible. Repetition frequencies of up to 4 kHz could be demonstrated. Many of the experiments are performed in repetitive bursts of variable lengths and spacing. This allows also to demonstrate that there is only little transient behavior upon switching on and off the source. Conversion efficiencies into the 2 percent frequency band around 13.5 nm are about 0.4 percent in 2p, comparable to the values reported from other groups. Another important parameter is the size of the light emitting region. Here we have studied the influence of electrode geometry and flow properties on the size, to find a best match to the requirements of the collection optics. A major problem for the design of a complete wafer illumination system is the out-of-band portion of the radiation. Especially the DUV fraction of the source spectrum is a concern because it is also reflected to some extend by the Mo-Si multilayer mirrors. We show that the source has a low overall non-EUV part of the emission. In particular, it is demonstrated that there is very little DUV coming out of the usable source volume, well below the specified level.

Paper Details

Date Published: 1 July 2002
PDF: 7 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472271
Show Author Affiliations
Joseph Pankert, Philips Extreem UV GmbH (Germany)
Klaus Bergmann, Fraunhofer-Institut fuer Lasertechnik (Germany)
J. Klein, Fraunhofer-Institut fuer Lasertechnik (Germany)
Willi Neff, Fraunhofer-Institut fuer Lasertechnik (Germany)
Oliver Rosier, Fraunhofer-Institut fuer Lasertechnik (Germany)
Stefan Seiwert, Fraunhofer-Institut fuer Lasertechnik (Germany)
Christopher Smith, Fraunhofer-Institut fuer Lasertechnik (Germany)
Rolf Apetz, Philips Extreem UV GmbH (Germany)
Jeroen Jonkers, Philips Extreem UV GmbH (Germany)
Michael Loeken, Philips Extreem UV GmbH (Germany)
Guenther H. Derra, Philips Research Labs. (Germany)


Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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