Share Email Print
cover

Proceedings Paper

AR layer properties for high-power laser prepared by neutral-solution processing
Author(s): Fang Feng Wu; Kai Su
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The AR layer prepared by chemical method is of renewed interest due to its higher laser damage threshold than that of AR film deposited by the vacuum evaporation method. The AR layer has been prepared on BK-7 glass substrate by neutral-solution processing in our laboratory and the results were reported in 1989. Recently, we improved the preparated condition that the transmittance increase from 99% at 1.06 micrometers and the laser damage threshold still remain about twice as the AR film prepared by vacuum evaporation method. The cross structure of the AR layer has been observed by TEM.

Paper Details

Date Published: 1 November 1991
PDF: 3 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47210
Show Author Affiliations
Fang Feng Wu, Shanghai Institute of Optics and Fine Mechanics (China)
Kai Su, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

© SPIE. Terms of Use
Back to Top