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Proceedings Paper

Phase grating fabrication in glass via ion implantation
Author(s): Istvan Banyasz; Miklos Fried; Csaba Duecso; Zofia Vertesy
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Paper Abstract

Transmission phase gratings have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks. Both mono- and multienergy implantations have been applied. Diffraction efficiencies of the gratings as function of the energy and dose of the ion implantation were measured.The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast-microscopy and scanning electron microscopy. Diffraction efficiencies up to 20 % have been obtained.

Paper Details

Date Published: 3 April 2003
PDF: 12 pages
Proc. SPIE 4944, Integrated Optical Devices: Fabrication and Testing, (3 April 2003); doi: 10.1117/12.472008
Show Author Affiliations
Istvan Banyasz, Research Institute for Solid State Physics and Optics (Hungary)
Miklos Fried, Research Institute for Technical Physics and Materials Science (Hungary)
Csaba Duecso, Research Institute for Technical Physics and Materials Science (Hungary)
Zofia Vertesy, Research Institute for Technical Physics and Materials Science (Hungary)


Published in SPIE Proceedings Vol. 4944:
Integrated Optical Devices: Fabrication and Testing

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