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Proceedings Paper

Fabrication of cold light mirror of film projector by direct electron-beam-evaporated TiO2 and SiO2 starting materials in neutral oxygen atmosphere
Author(s): Di Sheng Zhong; Guang Zhong Xu; Wi Liu
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Paper Abstract

This paper introduces a process suitable to applied production of a cold light mirror of a film projector on a large scale. Deposition parameters required for producing a TiO2/SiO2 optical multilayer systems by electron beam evaporation of TiO2 and SiO2 starting materials are investigated. Manufacture and techniques of a cold mirror and the adhesion, stability, wear, and corrosion resistance of a cold mirror by this process are discussed. The results show that cold mirrors have good optical properties and better adhesion.

Paper Details

Date Published: 1 November 1991
PDF: 9 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47195
Show Author Affiliations
Di Sheng Zhong, Laoning Univ. (China)
Guang Zhong Xu, Institute of Instrumentation Technology (China)
Wi Liu, Institute of Instrumentation Technology (China)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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