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Proceedings Paper

Patterning of thin films of TiNi deposited on silicon substrate
Author(s): Vijaya Kumar Mathe; Dinesh K. Sood; Jason P. Hayes
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Paper Abstract

Actuators made from patterned Ti-based shape memory alloy films have potential applications in micro systems owing to their high mechanical output and other favourable characteristics. Micro fabrication techniques such as chemical etching and electrolytic photo etching have been used for patterning these alloy films. The latest trend is to use laser micromachining owing to its advantages in terms of non-contact processing, achievable resolution and pattern flexibility. Successful excimer laser micromachining of TiNi in the forms of as- rolled strips (bulk) and RF Sputter deposited, free - standing foils, with different combinations of laser parameters have been recently reported. However, sufficient data pertaining to laser micromachining of these alloy films deposited on silicon substrates are required for their applications to silicon based MEMS. We have attempted to micromachine TiNi shape memory alloy films on silicon substrate deposited by DC- magnetron sputtering using a Ti54Ni46 alloy target. These films were micromachined by KrF excimer laser induced ablation at 248nm. The dependence of TiNi material removal mechanisms and feature quality on laser parameters such as fluence, pulse repetition frequency and number of shots are presented.

Paper Details

Date Published: 13 November 2002
PDF: 11 pages
Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); doi: 10.1117/12.471927
Show Author Affiliations
Vijaya Kumar Mathe, RMIT Univ. (Australia)
Dinesh K. Sood, RMIT Univ. (Australia)
Jason P. Hayes, Swinburne Univ. of Technology (Australia)


Published in SPIE Proceedings Vol. 4936:
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
Dinesh K. Sood; Ajay P. Malshe; Ryutaro Maeda, Editor(s)

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