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Proceedings Paper

Optimization of Au mask fabrication processes for LIGA applications
Author(s): Xue Chuan Shan; Ryutaro Maeda; Tsuyoshi Ikehara; H. Mekaru; T. Hattori
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Paper Abstract

This paper presents approaches to fabricate Au masks for LIGA process. The proposed fabrication process starts with deposition of a thick layer of Au film, then followed by electron cyclotron resonance (ECR) Ar+ etching and coating of a polymer material that is used as a membrane. Finally the ICP DRIE etching is applied from backside to figure out the membrane. The profiles of the Au microstructures on the mask have been improved thanks to the optimization of etching process and photoresist material. The fabricated masks have been used in the X-ray lithography and demonstrated a well acceptable performance. A nickel mold has been successfully realized by electroplating and used in a hot embossing process for forming optical components. Au masks made by using conventional Au-electroplating technique have also been demonstrated for a comparison.

Paper Details

Date Published: 13 November 2002
PDF: 9 pages
Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); doi: 10.1117/12.471926
Show Author Affiliations
Xue Chuan Shan, National Institute of Advanced Industrial Science and Technology (Japan)
Singapore Institute of Manufacturing Technology (Singapore)
Ryutaro Maeda, National Institute of Advanced Industrial Science and Technology (Japan)
Tsuyoshi Ikehara, National Institute of Advanced Industrial Science and Technology (Japan)
H. Mekaru, Himeji Institute of Technology (Japan)
T. Hattori, Himeji Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 4936:
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
Dinesh K. Sood; Ajay P. Malshe; Ryutaro Maeda, Editor(s)

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