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Proceedings Paper

Effect of oxygen on optical properties of yttria thin films
Author(s): Xuantong Ying; Albert Feldman; Edward N. Farabaugh
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Paper Abstract

A series of yttria optical thin films was prepared under different oxygen partial pressures by electron beam evaporation. A multiparameter nonlinear curve fit method was used to determine the refractive index, absorption coefficient, and thickness of these films. The experimental result indicates the partially oxidized materials inside the films that reduce the transmittance of the films could be oxidized by oxygen backfilled into deposition chamber during the evaporation process to produce optical yttria thin films with low absorption coefficient.

Paper Details

Date Published: 1 November 1991
PDF: 6 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47184
Show Author Affiliations
Xuantong Ying, Fudan Univ. (China)
Albert Feldman, National Institute of Standards and Technology (United States)
Edward N. Farabaugh, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications

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