Share Email Print

Proceedings Paper

Modeling of chemical processes in the dynamic expansion for pulsed laser deposition
Author(s): Ernst-Wolfgang Kreutz; Mirko Aden; Markus Niessen; Andreas Husmann; Reinhart Poprawe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The material transfer from the target to the substrate involved in pulsed laser deposition is described with respect to chemical reactions in the processing gas atmosphere in order to derive the laser parameters and the processing variables necessary for the deposition to thin films with application-adapted properties. The heating and removal are described by the conversion of the optical energy into internal energy followed by a phase transition form the condensed to the gaseous state. The delivered energy becomes distributed into different channels of decomposition in accordance to the temperature. The dynamics of the volatile species is calculated by the use of non- dissipative continuum mechanical equations of the conversion laws of mass, momentum, and energy. The flow field patterns of the gas phase during the material transfer of the polymers PE, PP and PMMA and the ceramic Al2O3 are calculated. The modeling calculating are direction towards the spatial and temporal dependence of the total and partial pressures either of the materials to be processed or of the processing gas species. The mathematical models are applied to the polymers PE, PP, and PMMA and to the ceramic Al2O3 following the chemical composition in thermodynamic equilibrium. The main emphasis of the calculations is to derive parameters and processing variables for pulsed laser film deposition in the case of other material properties.

Paper Details

Date Published: 18 June 2002
PDF: 10 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470658
Show Author Affiliations
Ernst-Wolfgang Kreutz, RWTH Aachen (Germany)
Mirko Aden, RWTH Aachen (Germany)
Markus Niessen, RWTH Aachen (Germany)
Andreas Husmann, RWTH Aachen (Germany)
Reinhart Poprawe, RWTH Aachen (Germany)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund Jr.; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

© SPIE. Terms of Use
Back to Top