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Proceedings Paper

Direct writing of planar ultracapacitors by laser forward transfer processing
Author(s): Craig B. Arnold; Ryan C. Wartena; Bhanu Pratap; Karen E. Swider-Lyons; Alberto Pique
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Paper Abstract

We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write, in combination with UV laser micromachining, to fabricate mesoscale ultracapacitors and micro batteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different desorption formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO2 0.5 H2O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.

Paper Details

Date Published: 18 June 2002
PDF: 8 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470641
Show Author Affiliations
Craig B. Arnold, Naval Research Lab. (United States)
Ryan C. Wartena, Naval Research Lab. (United States)
Bhanu Pratap, Naval Research Lab. (United States)
Karen E. Swider-Lyons, Naval Research Lab. (United States)
Alberto Pique, Naval Research Lab. (United States)


Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Willem Hoving; Koji Sugioka; Malcolm C. Gower; Richard F. Haglund; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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