Share Email Print
cover

Proceedings Paper

Effect of laser parameters on the exposure and selective etch rate in photostructurable glass
Author(s): Frank E. Livingston; William W. Hansen; Adam Huang; Henry Helvajian
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Photostructurable glass-ceramic materials have received significant attention due to their utility in aerospace engineering and micro technology. For example, the ability to fabricate structures in glass is important in the design and integration of micro scale electronic, optical and fluidic devices. Direct-write pulsed UV laser processing techniques have been utilized recently to create patterned 3D microstructures in a lithium-aluminosilicate glass. The direct-write microfabrication process involves the formation of an initial latent image in the glass via UV laser radiation. Thermal-induced ceramization is utilized to develop the latent image into a permanent image. Material removal and microstructure fabrication are then accomplished by preferential isotropic etching of the developed regions.

Paper Details

Date Published: 18 June 2002
PDF: 9 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470631
Show Author Affiliations
Frank E. Livingston, The Aerospace Corp. (United States)
William W. Hansen, The Aerospace Corp. (United States)
Adam Huang, The Aerospace Corp. (United States)
Henry Helvajian, The Aerospace Corp. (United States)


Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Willem Hoving; Koji Sugioka; Malcolm C. Gower; Richard F. Haglund; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

© SPIE. Terms of Use
Back to Top