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Proceedings Paper

UV laser radiation-induced modifications and microstructuring of glass
Author(s): Marc Talkenberg; Ernst-Wolfgang Kreutz; Alexander Horn; Michael Jacquorie; Reinhart Poprawe
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Paper Abstract

Modifications and microstructures are generated on the surface and in the volume of silicate glasses using pulsed UV laser radiation of small pulse length. During the interaction of pulsed excimer laser radiation and frequency-trippled Nd:YAG laser radiation with intensities below the removal-threshold of the cerium- and silver-doped multi-component silicate glass absorption centers in the UV are induced. Subsequent thermal treatment and wet chemical etching results in crystallization of the laser-illuminated absorbing region and in the fabrication of microstructures on the surface. Processing of sodalime- and boro-silicate glass with pulsed ArF excimer laser radiation and frequency-doubled Nd:YAG laser radiation with intensities above the removal-threshold leads to microstructures including the generation of microcracks on the surface and in the bulk. The dynamics and the transmission of the expanding plasma and changes in the refractive index of the glass are investigated with speckle photography using the pump and probe method. The determination of plasma emission and crack generation is carried out using high speed and Nomarski photography. Morphological and chemical properties of the debris generated under defined processing gas atmospheres are investigated with REM, white light interferometry, XPS and EPMA. Induced absorption and changes of the crystalline- phase are probed using optical-spectroscopy and XRD as well REM. On the basis of these investigations the processes of the generation of induced absorption centers and crystallization on the one hand and the generation of cracks and debris on the other hand as well as the quality of the produced microstructures is discussed.

Paper Details

Date Published: 18 June 2002
PDF: 12 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470630
Show Author Affiliations
Marc Talkenberg, RWTH-Aachen (Germany)
Ernst-Wolfgang Kreutz, RWTH-Aachen (Germany)
Alexander Horn, RWTH-Aachen (Germany)
Michael Jacquorie, RWTH-Aachen (Germany)
Reinhart Poprawe, RWTH-Aachen and Fraunhofer-Institut fuer Lasertechnik (Germany)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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