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Proceedings Paper

Onset of laser ablation in CaF2 crystal under excimer laser irradiation
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Paper Abstract

With the widespread application of excimer lasers for micro- processing, optically transparent materials in the UV region have become more important as optical components. The transparent materials currently available commercially are silica glass and fluoride crystals, CaF2 and MgF2. The resistance of these materials against cumulative irradiation of excimer lasers is required from the viewpoint of application, and it is important to clarify the mechanisms of the optical damage on these materials. In this paper, we report the onset of laser ablation, that is, the initiation of optical breakdown and plume formation, in CaF2 crystal under cumulative irradiation of an ArF excimer laser. When the laser fluence is below the ablation threshold, a blue luminescence due to self-trapped exciton is observed from the whole laser-irradiated region. When the fluence ins increased near the threshold, successive irradiation finally cause a bright, localized luminescence due to the initiation of laser ablation. SEM images of the laser-damaged region show two features: (1) a small bump with pits of the order of 0.1 micrometers formed by UV laser absorption and following local heating, (2) small cracks with triangular fragments caused by mechanisms stress under local heating.

Paper Details

Date Published: 18 June 2002
PDF: 8 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470624
Show Author Affiliations
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Akira Yabe, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Willem Hoving; Koji Sugioka; Malcolm C. Gower; Richard F. Haglund; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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