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Proceedings Paper

Microfabrication by a high-fluence femtosecond exposure: mechanism and applications
Author(s): Mitsuru Watanabe; Saulius Juodkazis; Junji Nishii; Shigeki Matsuo; Hiroaki Misawa
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Paper Abstract

We report the observation of 3/2-frequency generation during an Optically-induced failure of silica under femtosecond laser pulse irradiation. The origin of 3/2-frequency generation is due to a two-plasmon decay instability, which occurs at the quarter critical density of free charge carriers. We observed this emission during the optical damaging of glasses by tightly focused femtosecond laser pluses. The pulse duration at the irradiation spot was about 0.35 ps, the energy 25-250 nJ, and the damage was recorded in a single shot event inside the glass. The emission at about 530 nm was only present in the spectra measured during an optical damage by 795 nm irradiation with the pulse energy 9 times and more higher than the threshold. We observed a new phenomenon applicable for microstructuring of glass. The high energy fs pulses were focused by a plano- convex lens on the exit surface of a glass plate. The surface was ablated and the ablation was transferred into a volume of glass by translation of a 'plasma spark'. The length of such a channels can by up to few-cm and with a diameter of tens-of-micrometers. The mechanisms and application of high-fluence fs fabrication in dielectrics is discussed.

Paper Details

Date Published: 18 June 2002
PDF: 10 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470618
Show Author Affiliations
Mitsuru Watanabe, Univ. of Tokushima (Japan)
Saulius Juodkazis, Univ. of Tokushima (Japan)
Junji Nishii, National Institute of Advanced Industrial Science and Technology (Japan)
Shigeki Matsuo, Univ. of Tokushima (Japan)
Hiroaki Misawa, Univ. of Tokushima (Japan)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund Jr.; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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