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Proceedings Paper

Excimer ablation of ITO on flexible substrates for large format display applications
Author(s): Osman A. Ghandour; Dan Constantinide; Ronald E. Sheets
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Paper Abstract

Excimer-based ablative patterning of Indium Tin Oxide (ITO) thin film on flexible substrates has been evaluated for large format display applications. In display package manufacturing, excimer-based ITO ablation can provide a great advantage over conventional photolithographic processing. It can eliminate many steps from the manufacturing cycle, resulting in significant cost reduction. Flexible substrate display packaging is desirable for at least two reasons. It allows roll-to-roll low cost, large volume manufacturing. Its low weight provides for an easy scale up to larger format displays. An XeCl excimer, 1x, amplitude mask pattern projection, scan-and-repeat system was utilized in the evaluation work. The mask pattern had line groupings of line-widths varying from 8 to 30 micrometers with line length of 44 mm. Lines from all the groupings were simultaneously ablated in 150 nm-thick ITO layer on a flexible 100 micrometers thick Polyethylene terephtalate (PET) substrate using scanning with optimized dwell duration of 10 pulses and optimized fluence level of 350 mJ/cm2. Lines ablated with mask line groupings of line-width greater than or equal to 11 micrometers showed complete electrical isolation indicating complete ITO removal. Scanning electron Microscopy (SEM) showed the presence of a slight curling effect at ablated line edges. The effect was studied as a function of wavelength and imaging resolution. A CO2 cleaning method was evaluated for removing the extruding curled material.

Paper Details

Date Published: 18 June 2002
PDF: 12 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470610
Show Author Affiliations
Osman A. Ghandour, Tamarack Scientific Co., Inc. (United States)
Dan Constantinide, Tamarack Scientific Co., Inc. (United States)
Ronald E. Sheets, Tamarack Scientific Co., Inc. (United States)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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