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Proceedings Paper

Micrograting device using electron-beam lithography
Author(s): Tsukasa Yamashita; Shigeru Aoyama
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Paper Abstract

Recent trends in laser application systems such as optical information systems, optical network systems, and optical measurement systems have presented a need for small size, light weight, low cost, and mass productivity. Advantages of a micro grating device in laser beam application systems are high integration capability, design flexibility, and mass productivity. In this paper, recent investigations of the micro gating devices using electron-beam lithography are described, with emphasis on clarifying both their uses and fundamental optical characteristics.

Paper Details

Date Published: 1 September 1991
PDF: 13 pages
Proc. SPIE 1507, Holographic Optics III: Principles and Applications, (1 September 1991); doi: 10.1117/12.47030
Show Author Affiliations
Tsukasa Yamashita, Omron Corp. (Japan)
Shigeru Aoyama, Omron Corp. (Japan)

Published in SPIE Proceedings Vol. 1507:
Holographic Optics III: Principles and Applications
G. Michael Morris, Editor(s)

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