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Proceedings Paper

Nickel nanoparticles dispersed in SiO2 fabricated by high-flux negative-ion implantation of 60 keV
Author(s): Hiroshi Amekura; Hideaki Kitazawa; Takashi Mochiku; Naoki Umeda; Yoshihiko Takeda; Naoki Kishimoto
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Paper Abstract

The magnetic nanoparticles are fabricated in silica glass (SiO2) using high-flux implantation of nickel negative-ions of 60 keV. Photo-absorption measurements and the cross-sectional transmission electron microscopy (XTEM) observation confirm formation of metallic Ni nanoparticles in SiO2, and exclude possible formation of Ni silicides (Ni3Si, Ni2Si, NiSi) and oxides (NiO) as major products. The mean diameter of the nanoparticles was in ~2.9 nm, and the depth distribution was similar to the prediction from the TRIDYN code with taking account of the sputtering. Temperature- and field- dependences of magnetization show that the nanoparticles are in the super-paramagnetic state with a blocking temperature of ~27 K.

Paper Details

Date Published: 13 November 2002
PDF: 8 pages
Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); doi: 10.1117/12.469676
Show Author Affiliations
Hiroshi Amekura, National Institute for Materials Science (Japan)
Hideaki Kitazawa, National Institute for Materials Science (Japan)
Takashi Mochiku, National Institute for Materials Science (Japan)
Naoki Umeda, Univ. of Tsukuba (Japan)
Yoshihiko Takeda, National Institute for Materials Science (Japan)
Naoki Kishimoto, National Institute for Materials Science (Japan)


Published in SPIE Proceedings Vol. 4936:
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
Dinesh K. Sood; Ajay P. Malshe; Ryutaro Maeda, Editor(s)

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