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Proceedings Paper

Laser plasma XUV sources: a role for excimer lasers?
Author(s): Fred Bijkerk; Alexander P. Shevelko
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Paper Abstract

Radiative characteristics of laser-plasma XUV sources are reviewed. The dependence of the main plasma parameters on the heating laser wavelength is discussed, as well as the use of application-specific excimer lasers to generate XUV radiation. A comparison is given with other XUV sources, such as electron storage rings. Examples of the application of normal- incidence multilayer XUV optics, e.g., to collimate the laser-plasma radiation or for projection lithography, are given.

Paper Details

Date Published: 1 September 1991
PDF: 11 pages
Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46950
Show Author Affiliations
Fred Bijkerk, FOM-Instituut voor Plasmafysica Rijnhuizen (Netherlands)
Alexander P. Shevelko, Lebedev Physical Institute (Russia)

Published in SPIE Proceedings Vol. 1503:
Excimer Lasers and Applications III
Tommaso Letardi; Lucien Diego Laude, Editor(s)

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