Share Email Print
cover

Proceedings Paper

Nanometer-accurate grating fabrication with scanning beam interference lithography
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.

Paper Details

Date Published: 13 November 2002
PDF: 9 pages
Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); doi: 10.1117/12.469431
Show Author Affiliations
Carl G. Chen, Massachusetts Institute of Technology (United States)
Paul T. Konkola, Massachusetts Institute of Technology (United States)
Ralf K. Heilmann, Massachusetts Institute of Technology (United States)
Chulmin Joo, Massachusetts Institute of Technology (United States)
Mark L. Schattenburg, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 4936:
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
Dinesh K. Sood; Ajay P. Malshe; Ryutaro Maeda, Editor(s)

© SPIE. Terms of Use
Back to Top